[20a-B203-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-B203-2] Diagnostic of Ti(acac)₄ mist transport in tubular furnace

〇(M2)Kojun Yokoyama¹, Kuddus Abdul¹, Hajime Shirai¹ (1.Saitama Univ.)

Keywords:Mist-CVD, Trench substrate, TiO2

Previously, we reported on the deposition of TiO₂ film in a trench by intermittent mist CVD method, in which the mist supply time t₁ and confinement t₂ were repeated. In a trench with an aperture/depth (W/D) = 4/10 μm, uniform deposition was observed up to confinement times of t₁ = 4 min and t₂ = 2 min. However, at W/D = 4/20 μm, the film saturated at step coverage (SC) ~ 0.6. On the other hand, at t₁= 16 min, SC improved to ~0.8. These results suggest that the behavior within t₁ and t₂ time dominates the uniformity in the trench. In the present study, the effect of the particle size distribution of the mist in the tube furnace on the deposition will be discussed along with the simulation results.