[20a-B203-1~10] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-B203-3] Fabrication of anatase TiO₂ thin films by water-based mist-CVD

〇Tomohito Sudare¹, Han Xu¹, Yumie Miura¹, Ryo Nakayama¹, Ryota Shimizu¹, Naoomi Yamada², Kentaro Kaneko³, Taro Hitosugi^1,4 (1.Tokyo Tech., 2.Chubu Univ., 3.Kyoto Univ., 4.Univ. Tokyo)

Keywords:mist CVD, titanium dioxide