[20a-C202-1~11] 15.7 Crystal characterization, impurities and crystal defects

△ [20a-C202-3] Mechanisms of crack generation and suppression in hetero growth of strain-induced semiconductor thin films

〇Youya Wagatsuma¹, Rena Kanesawa¹, Alam Md. Mahfuz^1,2, Kazuya Okada¹, Takahiro Inoue¹, Michihiro Yamada³, Kohei Hamaya^3,4, Kentarou Sawano¹ (1.Tokyo City Univ., 2.Univ. of Barishal, 3.CSRN, Osaka Univ., 4.OTRI, Osaka Univ.)

Keywords:SiGe, crack