The 83rd JSAP Autumn Meeting 2022

Presentation information

Oral presentation

13 Semiconductors » 13.6 Nanostructures, quantum phenomena, and nano quantum devices

[20p-C401-1~16] 13.6 Nanostructures, quantum phenomena, and nano quantum devices

Tue. Sep 20, 2022 1:30 PM - 6:00 PM C401 (C401)

Toshihiro Nakaoka(Sophia Univ.), Ryuichi Ohta(NTT), Takayuki Hasegawa(Osaka Inst. of Tech.)

2:45 PM - 3:00 PM

[20p-C401-6] PL enhancement of InAs surface quantum dots by ex situ DEZ/ZnO passivation/capping

〇(D)Hanif Mohammadi1, Ronel Roca1, Yuwei Zhang1, Hyunju Lee1, Naotaka Iwata1, Yoshio Ohshita1, Itaru Kamiya1 (1.Toyota tech. inst.)

Keywords:Surface quantum dot, Passivation and capping, ZnO

Molecular beam epitaxy-grown InAs surface quantum dots passivation and capping is achieved by ex situ low temperature plasma enhanced atomic layer deposition of ZnO with diethlzinc, as zinc precursor, and plasma oxygen at 200 degree Celsius.Photoluminescence enhancements up to 2-fold for surface quantum dots is related to the DEZ "self-clean-up" effect, in which during DEZ deposition surface native oxides removed and ZnO formed on the surface. For investigating the passivation mechanism, energy dispersive X-ray spectroscopy and X-ray photoelectron spectroscopy were used. The Atomic force microscopy and scanning electron microscopy images shows the surface quantum dots shape and size preservation after capping, which resulted in suppression of the blueshift.