[21a-C202-1~12] 17.3 Layered materials

[21a-C202-11] Research on sputter deposition rate dependence of MoS₂ film quality

〇Shinya Imai¹, Ryo Ono¹, Iriya Muneta¹, Kuniyuki Kakushima¹, Tetsuya Tatsumi¹, Shigetaka Tomiya¹, Kazuo Tsutsui¹, Hitoshi Wakabayashi¹ (1.Tokyo Tech.)

Keywords:molybdenum disulfide, sputtering