[21p-B104-1~8] Semiconductor Manufacturing and Process Technologies for Green Transformation

[21p-B104-2] Power Consumption Reduction of Semiconductor Manufacturing by Nanoimprint Technology

〇Koji Ichimura¹, Masaaki Kurihara¹ (1.Dai Nippon Printing)

Keywords:semiconductor, nanoimprint, carbon neutrality

Increase of power consumption during semiconductor manufacturing is gathering attention in recent years. One of its main causes is increase of power consumption during the lithography process steps which is developed to meet required pattern shrinkages. Power of ALD tools used at SAQP in ArF immersion lithography and of light source used in EUV exposure tools increased the power usage of lithography prodcess. On the other hand, nanoimprint lithography, which transfer the patterns with pressing the templates to the substrates, is low power consumption and low cost-of-ownership process and is expected to contribute to the carbon neutrality of semiconductor manufacturing.