[22a-B102-1~6] 15.2 II-VI族結晶および多元系結晶

▲ [22a-B102-1] Investigation on threading dislocation reduction in CdTe/Si epitaxial layer using post-growth patterning and annealing technique

〇Bal Singh Chaudhari¹、Yutaka Takagi¹、Ryo Okumura¹、Madan Niraula¹ (1.NITech)

キーワード：semiconductor, thin film growth