[22p-A202-1~22] 6.2 Carbon-based thin films

△ [22p-A202-14] The dependence of hydrogen plasma etching on diamond crystal orientation

〇Daichi Yoshii¹, Mami Fujii², Mutsunori Uenuma¹, Yukiharu Uraoka¹ (1.NAIST, 2.Kindai Univ.)

Keywords:Diamond, Atomic Force Microscope, Electron BackScatter Diffraction

Clarifying the effects and role of hydrogen plasma on diamond surfaces is a critical aspect in the field of diamond electronics. However, previous studies have been limited to representative crystallographic orientations, with no detailed investigation of intermediate orientations, and no systematic etching tendency for crystallographic orientations have been demonstrated. In this study, we evaluated the tendency by atomic force microscopy and electron backscatter diffraction.