Temperature Compensation in Minimal Laser Heating Furnace(Ⅱ)

kazushige sato, Takashi Chiba, Masao Terada, Kengo Hamada, Sommawan Khumpuang, Shiro Hara

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[24a-E103-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Thu. Mar 24, 2022 9:00 AM - 12:30 PM E103 (E103)

Kuniyuki Kakushima(Tokyo Tech), Tatsuya Okada(Univ. of the Ryukyus)

11:45 AM - 12:00 PM

[24a-E103-11] Temperature Compensation in Minimal Laser Heating Furnace(Ⅱ)

〇kazushige sato^1,3, Takashi Chiba^1,3, Masao Terada^1,3, Kengo Hamada^1,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.MINIMAL, 2.AIST, 3.Sakaguchi E.H VOC Corp.)

Keywords:Minimal Fab, Laser Heating

ミニマルレーザ加熱装置を、イオン注入後の活性化アニールへの適用を想定し、TiNゲート電極のウェハ占有率を変え加熱への影響等を調べた。