The 69th JSAP Spring Meeting 2022

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8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[25a-E104-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 25, 2022 9:00 AM - 12:00 PM E104 (E104)

Masanaga Fukasawa(Sony Semiconductor Solutions), Masanobu Honda(Tokyo Electron Miyagi)

11:00 AM - 11:15 AM

[25a-E104-8] Time-resolved measurements of ions in a dual-frequency capacitively-coupled Ar/C4F8/O2 pulsed plasma by mass spectrometry

〇(M1)Yuto Seki1, Haruhito Kato1, Schuichi Kuboi1, Haruka Suzuki1,2, Hirotaka Toyoda1,2,3 (1.Nagoya Univ., 2.cLPS, Nagoya Univ., 3.NIFS)

Keywords:dual-frequency capacitively-coupled plasma, Time-resolved measurement