The 69th JSAP Spring Meeting 2022

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15 Crystal Engineering » 15.4 III-V-group nitride crystals

[25a-E203-1~11] 15.4 III-V-group nitride crystals

Fri. Mar 25, 2022 9:00 AM - 12:00 PM E203 (E203)

Hiroto Sekiguchi(Toyohashi Univ. of Tech.), Momoko Deura(Univ. of Tokyo)

11:15 AM - 11:30 AM

[25a-E203-9] Growth of AlInN films on a fully relaxed semipolar {11-22} GaInN

〇Takahiro Fujisawa1, Taiki Nakabayashi1, Takashi Egawa1, Makoto Miyoshi1, Tetsuya Takeuchi2, Narihito Okada3, Kazuyuki Tadatomo3 (1.Nagoya Inst. Tech., 2.Meijo Univ., 3.Yamaguchi Univ.)

Keywords:MOCVD, AlInN