The 69th JSAP Spring Meeting 2022

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Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[25p-E104-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 25, 2022 1:00 PM - 6:30 PM E104 (E104)

Akihisa Ogino(Shizuoka Univ.), Toru Harigai(Toyohashi Univ. of Tech.)

5:00 PM - 5:15 PM

[25p-E104-16] Low temperature synthesis of a-SiC:F thin films by electron irradistion on c-C4F8/Si(CH3)4 mixed condensed layer.

〇(M2)Shuntaro Toda1, Tetsuya Sato1 (1.Univ. of Yamanashi)

Keywords:plasma CVD, a-C:F thin films, cryo deposition