[25p-E104-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[25p-E104-4] Macro Particle Adhesion as a Function of Distance from Cathode in TiN Film Formation by Vacuum Arc Deposition

〇Yoshinori Saiki¹, Junpei Kito¹, Yuki Hashimoto¹, Takahiro Bando¹, Toru Harigai¹, Hirofumi Takikawa¹, Hiroki Gima², Hiroaki Sugita² (1.Toyohashi Univ. Technol., 2.OSG Coating Service Co., Ltd)

Keywords:vacuum arc depotision, macro particle, TiN film

The demand for difficult-to-machine materials has been increasing with the development of industry such as automotive industry and aerospace industry. In the cutting of difficult-to-machine materials, the use of protective coatings on cutting tools is required to improve machining efficiency and extend their tool life. In this study, we formed TiN protective films with different distances between the cathode and the substrates by vacuum arc deposition system and investigated macro particle adhesion as a function of distance from cathode. At the distance of 360 mm between the cathode and the substrate, there were no large droplets which are larger than 5 μm, and the number of droplets was reduced by 70% compared to that directly under the cathode.