Shunya Kawamura

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM

△ [17p-A205-13] Influence of sheath collision on angular distribution of high energy particles incident on an RF electrode in a dual-frequency capacitively-coupled plasma

〇(B)Shunya Kawamura¹, Keita Ichikawa¹, Haruka Suzuki¹, Daiki Iino², Hiroyuki Fukumizu², Kazuaki Kurihara², Toyoda Hirotaka¹ (1.Nagoya Univ., 2.Kioxia Corp.)

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