Oral presentation
8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment
Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)
Kazuhiro Karahashi(Osaka univ.), Sumiko Fujisaki(Hitachi, Ltd.)
△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above
1:00 PM - 1:15 PM
〇Hiroharu Kawasaki1, Takahiko Satake1,2, Shin-ichi Aoqui2 (1.Nat,l Ins. Tech., Sasebo Col., 2.Sojo Univ.)
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1:15 PM - 1:30 PM
〇Natsumi Hirayama1, Ayaka Asami1, Yu Yamakawa1, Seisaku Oshiro1, Kazuhiro Uneyama1 (1.Sakura Color Products Corp.)
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1:30 PM - 1:45 PM
〇Naoki Tamura1, Toshimitsu Nomura1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.Osaka Univ.)
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1:45 PM - 2:00 PM
〇Kohshi Taguchi1, Motohiro Yamahara1, Mina Tomikawa1, Kazuyuki Noborio1 (1.SAKIGAKE-Semiconductor Co., Ltd.)
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2:00 PM - 2:15 PM
〇Kohshi Taguchi1, Tomikawa Mina1, Yamahara Motohiro1, Noborio Kazuyuki1 (1.SAKIGAKE-Semiconductor Co., Ltd.)
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2:15 PM - 2:30 PM
〇Kohshi Taguchi1, Kashiwagi Daiki1, Noborio Kazuyuki1, Yamahara Motohiro1, Tomikawa Mina1, Yamamura Akihiro1 (1.SAKIGAKE-Semiconductor Co., Ltd.)
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2:30 PM - 2:45 PM
〇Shinya Ueno1, Motohiro Yamahara1, Kazuyuki Noborio1, Kohshi Taguchi1 (1.Sakigake Semiconductor Co., Ltd.)
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2:45 PM - 3:00 PM
〇Shota Nunomura1, Isao Sakata1, Takayoshi Tsutsumi2, Masaru Hori2 (1.AIST, 2.Nagoya Univ.)
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3:00 PM - 3:15 PM
〇Takahiro Goya1, Keiichiro Urabe1, Koji Eriguchi1 (1.Kyoto Univ.)
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3:30 PM - 3:45 PM
〇Takashi Shiota1, Makoto Satake1, Taku Iwase1, Yasushi Sonoda2 (1.Hitachi R&D, 2.Hitachi High-Tech)
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3:45 PM - 4:00 PM
〇Shohei Nakamura1,2, Atsushi Tanide1,2, Soichi Nadahara1,2, Kenji Ishikawa2, Osamu Oda2, Masaru Hori2 (1.SCREEN Holdings, 2.Nagoya Univ.)
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4:00 PM - 4:15 PM
〇Noboru Hiwasa1, Junji Kataoka1, Norikatsu Sasao1, Shuichi Kuboi1, Daiki Iino1, Kazuaki Kurihara1, Hiroyuki Fukumizu1 (1.KIOXIA Corp.)
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4:15 PM - 4:30 PM
〇(B)Shunya Kawamura1, Keita Ichikawa1, Haruka Suzuki1, Daiki Iino2, Hiroyuki Fukumizu2, Kazuaki Kurihara2, Toyoda Hirotaka1 (1.Nagoya Univ., 2.Kioxia Corp.)
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4:30 PM - 4:45 PM
〇(M1)Shunta Kawabata1, Tomoko Ito1, Song-Yun Kang2, Dongkyu Lee2, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (1.Osaka Univ., 2.Samsung Electronics)
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4:45 PM - 5:00 PM
〇(M2)Hibiki Kato1, Hiroaki Hanafusa1, Seiichirou Higashi1 (1.Graduate School of Advanced Science and Engineering, Hiroshima Univ.)
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5:00 PM - 5:15 PM
〇(M1)Tatsuya Kitai1, Siyuan Gao2, Satoshi Iwamoto2, Yasutomo Ota1 (1.Keio Univ., 2.RCAST, the Univ. of Tokyo)
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5:15 PM - 5:30 PM
〇RYOKO SUGANO1, TAKU IWASE1, KENICHI KUWAHARA2 (1.Hitachi R&D Group, 2.Hitachi High-tech)
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5:30 PM - 5:45 PM
〇Toshio Hayashi1, Kenji Ishikawa1, Makoto Sekine1, Masaru Hori1, Naoto Kodama1, Hirotaka Toyada1 (1.Nagoya Univ.)
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