Toshio Hayashi

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:30 PM - 5:45 PM

[17p-A205-18] Electronic properties of C₂F₄ and production mechanism of PTFE

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹, Naoto Kodama¹, Hirotaka Toyada¹ (1.Nagoya Univ.)