Shohei Nakamura

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:45 PM - 4:00 PM

[17p-A205-11] Atomic layer etching of AlGaN at high temperature using F₂-added Ar plasma

〇Shohei Nakamura^1,2, Atsushi Tanide^1,2, Soichi Nadahara^1,2, Kenji Ishikawa², Osamu Oda², Masaru Hori² (1.SCREEN Holdings, 2.Nagoya Univ.)