RYOKO SUGANO

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:15 PM - 5:30 PM

[17p-A205-17] SiGe/Si Selective Etching using F, N and CF radicals via Ab-initio Calculations

〇RYOKO SUGANO¹, TAKU IWASE¹, KENICHI KUWAHARA² (1.Hitachi R&D Group, 2.Hitachi High-tech)