Shunta Kawabata

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:30 PM - 4:45 PM

[17p-A205-14] Etching reactions of Si and SiO₂ by tungsten fluoride ion injections

〇(M1)Shunta Kawabata¹, Tomoko Ito¹, Song-Yun Kang², Dongkyu Lee², Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (1.Osaka Univ., 2.Samsung Electronics)