Hibiki Kato

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:45 PM - 5:00 PM

[17p-A205-15] Ultra-fast Etching of Photoresist Induced by Rapidly Heating and Atomic Oxygen Radical Supply by Reactive Atmospheric-pressure Thermal Plasma Jet

〇(M2)Hibiki Kato¹, Hiroaki Hanafusa¹, Seiichirou Higashi¹ (1.Graduate School of Advanced Science and Engineering, Hiroshima Univ.)