Kohshi Taguchi

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:45 PM A205 (Building No. 6)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17p-A205-1~18] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

1:45 PM - 2:00 PM

[17p-A205-4] Technology for long-term retention of surface modification properties by plasma.

〇Kohshi Taguchi¹, Motohiro Yamahara¹, Mina Tomikawa¹, Kazuyuki Noborio¹ (1.SAKIGAKE-Semiconductor Co., Ltd.)

2:00 PM - 2:15 PM

[17p-A205-5] Application of technology for long-term retention of plasma treatment
:hydrophobic treatment

〇Kohshi Taguchi¹, Tomikawa Mina¹, Yamahara Motohiro¹, Noborio Kazuyuki¹ (1.SAKIGAKE-Semiconductor Co., Ltd.)

2:15 PM - 2:30 PM

[17p-A205-6] Modification of hydroxyl group on surface with water vapor plasma by direct.

〇Kohshi Taguchi¹, Kashiwagi Daiki¹, Noborio Kazuyuki¹, Yamahara Motohiro¹, Tomikawa Mina¹, Yamamura Akihiro¹ (1.SAKIGAKE-Semiconductor Co., Ltd.)