Han XU

Speaker, Author, Co-Author

Thu. Mar 16, 2023 10:30 AM - 12:00 PM E102 (Building No. 12)

Oral presentation
| 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[16a-E102-1~6] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

11:15 AM - 11:30 AM

▲ [16a-E102-4] Depth profile of Nb in anatase Ti_1−xNb_xO₂ thin films grown by mist chemical vapor deposition method

〇(D)Han XU¹, Tomohito Sudare^1,4, Yumie Miura^1,4, Ryo Nakayama^1,4, Ryota Shimizu¹, Naoomi Yamada², Kentaro Kaneko³, Taro Hitosugi^1,4 (1.Tokyo Tech., 2.Chubu Univ., 3.Ritsumeikan Univ., 4.Univ. Tokyo)