Takayoshi Oshima

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Speaker, Author, Co-Author

Thu. Mar 16, 2023 1:30 PM - 4:45 PM E102 (Building No. 12)

Oral presentation
| 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[16p-E102-1~12] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

4:00 PM - 4:15 PM

[16p-E102-10] Anisotropic HCl gas etching of (001) β-Ga₂O₃ substrate

〇Takayoshi Oshima¹, Yuichi Oshima¹ (1.NIMS)

Fri. Mar 17, 2023 9:30 AM - 11:30 AM PB01 (Poster)

Poster presentation
| 21 Joint Session K "Wide bandgap oxide semiconductor materials and devices"
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[17a-PB01-1~25] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

9:30 AM - 11:30 AM

[17a-PB01-25] Anisotropic HCl gas etching of (010) β-Ga₂O₃ substrate

〇Takayoshi Oshima¹, Yuichi Oshima¹ (1.NIMS)