Takashi Oinoue

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:00 PM - 5:00 PM B414 (Building No. 2)

Oral presentation
| 13 Semiconductors
| 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

[17p-B414-1~15] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

1:45 PM - 2:00 PM

[17p-B414-4] Analysis of dependence on substrate crystal plane orientation in Si etching process with the HF/HNO₃ mixture

〇Takashi Oinoue¹, Kana Kurogi¹, Tomoki Hirano¹, Kenya Nishio¹, Suguru Saito¹, Atsushi Okuyama¹, Yoshiya Hagimoto¹, Hayato Iwamoto¹ (1.Sony Semiconductor)

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