Li Fenghao

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Speaker, Author, Co-Author

Fri. Mar 17, 2023 1:30 PM - 5:45 PM D419 (Building No. 11)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[17p-D419-1~15] 6.4 Thin films and New materials

5:15 PM - 5:30 PM

▲ [17p-D419-14] ReRAM characteristics utilizing pentacene/LaB_xN_y insulator stacked structure

〇Li Fenghao¹, Eun Ki Hong¹, JiaAng Zhao¹, Ohmi Shun-ichiro¹ (1.Tokyo Inst. of Technology)