The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and diagnostics

[15p-B309-1~19] 8.1 Plasma production and diagnostics

Wed. Mar 15, 2023 1:00 PM - 6:45 PM B309 (Building No. 2)

Tsuyohito Ito(Univ. of Tokyo), Manabu Tanaka(Kyushu Univ.)

3:00 PM - 3:15 PM

[15p-B309-7] Diagnosis of Spatial Distribution of Vibrational and Rotational Temperatures of Nitrogen Inductively Coupled Plasma by Tomographic Optical Emission Spectroscopic Measurement

Kazuma Yoneda1, Yuya Yamashita1, Kenta Doi2, Tetsuji Kiyota2, Keiichiro Asakawa2, Kenta Ishi1, Atsushi Nezu1, Hiroshi Akatsuka1 (1.Tokyo Tech, 2.ULVAC)

Keywords:optical emission spectroscopic measurement, tomography, nitrogen inductively coupled plasma

To gain a better understanding of discharges specific to molecular gases, it is important to investigate the characteristics of nitrogen plasma, as a typical example. In inductively coupled plasma (ICP), which is applied to semiconductor etching processes, the spatial distribution of rotational temperature that approximates the gas temperature is crucial. In this study, nitrogen inductively coupled plasma was measured by tomographic optical emission spectroscopy. The spatial distribution of vibrational and rotational temperatures of N2 and N2+ were diagnosed by spectral fitting.