[15p-PB03-1~15] 8 Plasma Electronics (Poster)

[15p-PB03-7] Control of Cu film structure prepared by dual bipolar HPPMS

Takuya Ohba¹, 〇Takeo Nakano¹, Md. Suruz Mian¹ (1.Seikei Univ.)

Keywords:Sputtering, Ionized PVD

We proposed a system equipped with two cathodes to increase the plasma potential during the high-power pulsed magnetron sputtering discharge. Each cathode was driven by bipolar pulse voltages shifted by half-period. Copper films were deposited, and the film structure modification by the positive voltage was demonstrated.