[16p-A302-1~8] Advanced Surface and Interface Technologies for Micro and Nanoscale Fabrication

[16p-A302-6] Nanoimprint Performance Improvements for Semiconductor Device Manufacturing

〇Keita Sakai¹ (1.Canon Inc.)

Keywords:nanoimprint

Previous studies have demonstrated Nanoimprint Lithography resolution better than 10 nm, making the technology suitable for the printing of several generations of critical memory levels with a single mold. In addition, resist is applied only where necessary, thereby eliminating material waste. Given that there are no complicated optics in the imprint system, the reduction in the cost of the tool, when combined with simple single level processing and zero waste leads to a cost model that is very compelling for semiconductor memory applications. Any new lithographic technology to be introduced into manufacturing must deliver either a performance advantage or a cost advantage. Key technical attributes include alignment, overlay, defectivity and throughput. In this paper, we address overlay and throughput improvements.