The 70th JSAP Spring Meeting 2023

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Symposium (Oral)

Symposium » Advanced Surface and Interface Technologies for Micro and Nanoscale Fabrication

[16p-A302-1~8] Advanced Surface and Interface Technologies for Micro and Nanoscale Fabrication

Thu. Mar 16, 2023 1:30 PM - 6:25 PM A302 (Building No. 6)

Shutaro Asanuma(AIST), Hayato Sone(Gunma University)

5:15 PM - 5:50 PM

[16p-A302-7] Additional Breakthrough Technology for Semiconductor Fabrication: Directed Self-assembly (DSA) and Sequential Infiltration Synthesis (SIS)

〇Koji Asakawa1 (1.Kioxia)

Keywords:Lithography, Directed Self-Assembly (DSA), Sequential Infiltration Synthesis (SIS)

The development of semiconductors with higher performance and larger capacity has been driven by lithography. Ultra-fine pattern resolution, lower Line Edge Roughness (LER), and high etch resistance are required. Directed Self-Assembly (DSA) and Sequential Infiltration Synthesis (SIS) have been investigated as such material technologies. The principles of DSA and SIS and their application in lithography will be described.