[17a-A205-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-A205-3] Plasma-Assisted Reactive Sputtering for Amorphous Gallium Oxide Thin Film Formation

〇Kosuke Takenaka¹, Hibiki Komatsu¹, Tomoki Fujimura¹, Susumu Toko¹, Keisuke Ide², Akinori Ebe³, Toshio Kamiya², Yuichi Setsuhara¹ (1.Osaka Univ., 2.MSL Tokyo Tech., 3.EMD Corp.)

Keywords:a-GaO, sputtering