The 70th JSAP Spring Meeting 2023

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[17a-A205-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Fri. Mar 17, 2023 9:00 AM - 11:30 AM A205 (Building No. 6)

Akihisa Ogino(Shizuoka Univ.)

10:00 AM - 10:15 AM

[17a-A205-5] Carbon nitride synthesis on carbon nanowalls using melamine gas

Kouta Ishigure1, Mineo Hiramatsu1, Takeda Keigo1 (1.Meijo university)

Keywords:carbon nanowall, Carbon nitride, melamine

Graphene has a three-dimensional structure called carbon nanowall (CNW), which is vertically oriented with respect to the substrate, including a single-layer or multi-layer planar form. In addition, carbon nitride is a material attracting attention as a photocatalyst, and it has been reported that it produces hydrogen and oxygen under visible light irradiation. Therefore, in this research, we aim to create a more efficient photocatalyst by synthesizing carbon nitride on CNW using melamine gas, taking advantage of the large specific surface area of CNW.