[17a-A205-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [17a-A205-6] Impact of hydrogen dilution on DLC film formation
by intermediate-pressure narrow gap plasma CVD

〇Mizuki Ueno¹, Kazuki Ishizaki¹, Hiroaki Kakiuchi¹, Hiromasa Ohmi¹ (1.Osaka Univ.)

Keywords:plasma, CVD, DLC

Diamond-like carbon (DLC) films have high hardness, low friction, controllable wear resistance, and excellent biocompatibility, which makes their application in the life sciences field even more promising. In CVD deposition, there is a problem that non-DLCisation of the film becomes apparent when the partial pressure of the raw material gas is increased in order to achieve faster deposition. In this report, the effect of hydrogen gas on the properties of the formed films was investigated by generating a medium-pressure narrow-gap plasma in an atmosphere containing a high partial pressure of CH₄ gas for the high-speed formation of DLC films.