[17a-A205-1~9] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

△ [17a-A205-9] Preparation of TiN Films by DC Vacuum Arc Deposition System with a coiled anode

〇jumpei kito¹, Yoshinori Saiki¹, Kento Homma¹, Seiya Watanabe¹, Takahiro Bando¹, Toru Harigai¹, Hirofumi Takikawa¹, Hiroki Gima², Hiroaki Sugita² (1.Toyohashi Univ. Technol., 2.OSG)

Keywords:filtered arc deposition, titanium nitride films, vacuum arc deposition

In this study, a coiled anode that generates a magnetic field using a DC arc was designed and employed in a vacuum arc deposition system. Its performance was evaluated by the formation of TiN films with and without the application of a magnetic field. The application of a magnetic field by the coiled anode was expected to increase the deposition rate and decrease the relative number of droplets. Furthermore, the use of the coiled anode increased the hardness of the films, yielding very hard films of 44 GPa.