[17a-D419-1~12] 6.4 Thin films and New materials

[17a-D419-3] Improvement of Inhomogeneity in Low Refractive Index Al₂O₃ Optical Thin Films by Sputtering and Electron Beam Evaporation

〇(M2)Hiroyasu Kato¹, Takayuki Matsudaira², Hiroshi Murotani¹ (1.Grad Sch.of Eng.,Tokai Univ., 2.SHINCRON Co.,Ltd)

Keywords:Al2O3 Optical Thin Films, Sputtering and Electron Beam Evaporation, Inhomogeneity

Generally, the effective refractive index of optical thin films is lowered by reducing the film density. In this study, we succeeded in fabricating low-refractive index Al₂O₃ optical thin films with a refractive index of about 1.32, which has practical mechanical strength, by using the bisynthetic film method. In this presentation, we aim to improve the inhomogeneity of Al₂O₃ optical thin films deposited by the sputtering and electron beam evaporation. The inhomogeneity of Al₂O₃ optical thin films deposited by the sputtering and electron beam evaporation is considered to be caused by the continuous columnar structure of the films.