2021年日本表面真空学会学術講演会

Presentation information

Surface Engineering/Thin Film/Semiconductor/Magnetic, Electronic, and Photonic devices/Electronic Material Processing(SE/TF/EMP/MI/MS)

[1Dp01-13] TF/SE/EMP/MI/MS

Wed. Nov 3, 2021 1:30 PM - 4:45 PM Room D (Kotohira)

Chair:

3:30 PM - 3:45 PM

[1Dp09S] Growth of Oxygen vacancy stabilized zirconia thin films by reactive HiPIMS

*Naoto Saito1, Adriano Panepinto2, Stephanos Konstantinidis2, Ming Yang1, Tetsuhide Shimizu1 (1. Tokyo metropolitan university, 2. University of Mons)

Stabilization of the cubic crystal of zirconia at room temperature is an important issue in order to realize zirconia thin films with excellent properties. The oxygen vacancy concentration has major role in stabilization. In this study, we investigated the feasibility of introducing oxygen vacancies into zirconia films by using the peak current stabilization technique based on the R-HiPIMS. As a result, a crystalline phase other than monoclinic appeared.