[1P25] Deposition of amorphous oxidized carbon films with PECVD using ether molecules as source molecules.
Deposition process of amorphous oxidized carbon film with PECVD using ether molecules as sources is investigated with MIR-IRAS. C=O density in the deposited film can be controlled with choice of source molecules.
抄録パスワード認証
抄録の閲覧にはパスワードが必要です。パスワードを入力して認証してください。