11:30 〜 11:45
[F-1-01] Fabrication of Thin Ferroelectric Hf0.5Zr0.5O2 Film by Millisecond Flash Lamp Annealing
Presentation style: Online
https://doi.org/10.7567/SSDM.2022.F-1-01
A ferroelectric Hf0.5Zr0.5O2 (HZO) thin film was formed by a short-time heat treatment using flash lamp annealing. For 10nm thick HZO, remnant polarization of about 30 uC/cm2 was obtained with higher endurance than RTA treatment. Further improvement of endurance was confirmed for thinner (5nm) HZO film.
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