14:15 〜 14:30
[K-6-03] Concentration Monitoring of H2O2 Based Slurry for Metal Chemical Mechanical Planarization (CMP) using Raman Spectroscopy
Presentation style: Online
https://doi.org/10.7567/SSDM.2022.K-6-03
Raman spectroscopy is a non-destructive, highly sensitive, rapid analysis method that measures the degree of Raman scattering of light to detect a specific component and is easy to use for liquid phase analysis due to low water interference. In this study, the feasibility of quantitative concentration monitoring was shown using Raman spectroscopy to detect H2O2 in slurry for Copper Chemical Mechanical Planarization (CMP) process. Through Raman analysis of H2O2 based slurry, it was found that the degree of Raman scattering was linearly changed ac-cording to the concentration of H2O2 in the slurry solution, and the equation showed high linearity with an R^2 value of 0.99. This result indicates that quantitative concentration analysis of H2O2 based slurry is possible using Raman spectroscopy.
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