International Display Workshops General Incorporated Association

Proceedings of the International Display Workshops Volume 30 (IDW '23)

Proceedings of the International Display Workshops Volume 30 (IDW '23)

2023年12月6日 〜 2023年12月8日
TOKI MESSE Niigata Convention Center

435件中(171 - 180)

[FMC2-1 (Invited)] Building Active Matrix MicroLED Displays by Additive Manufacturing (BAMBAM) – Paving the Way to a Sustainable Fine Pitch Video Wall

*Emmanuel Fuchs1, Prasanna Ramaswamy2, Holger Baur3, Sławomir Drozdek4, Dave Keeshan5, Patrick Willem6, Arthur Moisset7, Christophe Linchenau1, Aymeric Dufauret1, Hugues Lebrun1, Davina Moodelly1, Elisabeth Jacquin1, Thibault Catelain1, Frédéric Vachelard1, Denis Groeninck1, Alin  Fecioru2, Iwona Grądzka-Kurzaj4, Aneta Wiatrowska4, Clint Meyer5, Matt Meitl 5, Kai Waldner3, Norbert Fruehauf3, Mohammad Kiaee7, Igor Nakonechnyi7, Willem Walrevens7, Madeleine Vandenabeele6, Matthias Cosaert6 (1. Aledia (France), 2. X-Celeprint (Ireland), 3. USTUTT (Germany), 4. XTPL (Poland), 5. XDisplay (Ireland), 6. Barco (Belgium), 7. QustomDot (Belgium))

Proceedings of the International Display Workshops Volume 30 (IDW '23) |2023年12月6日(水) 14:50 〜 15:10 |PDF ダウンロード

[FMC2-3] Thin Film Photopatternable Quantum Dot Downconverters with High Optical Density

*Yu Kambe1, Alexis Miranda1, Nisa Zaheer1, Rivi J. Ratnaweera1, Forrest Etheridge1, Colin Suits2,1, Marissa Tranquilli1, Richard Schaller4,5, Dmitri Talapin3,1, Yu Kambe1 (1. NanoPattern Technologies (United States of America), 2. University of California, Berkeley (United States of America), 3. University of Chicago (United States of America), 4. Northwestern University (United States of America), 5. Argonne National Laboratory (United States of America))

Proceedings of the International Display Workshops Volume 30 (IDW '23) |2023年12月6日(水) 15:30 〜 15:50 |PDF ダウンロード

[FMC5-1] ViP Technology Progress and Performance Improving in AMOLED

*Yiming Xiao1, Zhendong Ding1, Yuan Yao1, Zengqiang Xia1, Xuejing Zhu1, Haohan Zhang1, Zhengkui Dong1, Bowen Yang1, Liusong Ni1, Yuting Fu1, Murong Xue1, Zhenhua Lou1, Yongqiang Du1, Hui Li1, Yiyou Lai1, CC Lee1, Xiujian Zhu2, Zhaoji Peng2, Deqiang Zhang2 (1. Hefei Visionox Technology Ltd. (China), 2. Visionox Technology Inc. (China))

Proceedings of the International Display Workshops Volume 30 (IDW '23) |2023年12月7日(木) 10:50 〜 11:10 |PDF ダウンロード

[FMC5-3] Highly Conductive Metal Film Dry Etching via ECR Plasma Source

*JinNyoung Jang1, Jong Hwa Lee1, Sangheon Lee2, Jae Hoon Jung1, Donghoon Kim3, MunPyo Hong3, Sang-Gab Kim4, Soo Ouk Jang5, Kiro Jung2, Chiwoo Kim2 (1. APS Research (Korea), 2. APS Inc. (Korea), 3. Korea University (Korea), 4. Samsung Display Corporation (Korea), 5. Korea institute of Fusion Energy (Korea))

Proceedings of the International Display Workshops Volume 30 (IDW '23) |2023年12月7日(木) 11:30 〜 11:50 |PDF ダウンロード

[FMC5-4] Fine Patterning of Cu and NiTi Metal Electrode by Reactive Proton Assisted Etching, with Application to High Resolution Stretchable AMOLED/AMLED

*MunPyo Hong1, Minyoung Kim1, Donghoon Kim1, Jin Nyoung Jang2, Jong Hwa Lee2, Sangheon Lee2, Chiwoo Kim2, Sang-Gab Kim3 (1. Korea University (Korea), 2. APS Research Corporation (Korea), 3. Samsung Display (Korea))

Proceedings of the International Display Workshops Volume 30 (IDW '23) |2023年12月7日(木) 11:50 〜 12:10 |PDF ダウンロード

435件中(171 - 180)