[B-1-6] Inter-Poly SiO2/Si3N4 Capacitor Films 5nm Thick for Deep Submicron LSIs

J. Yugami, T. Mine, S. Iijima, A. Hiraiwa (1.CENTRAL RESEARCH LABORATORY, HITACHI, LTD.)

https://doi.org/10.7567/SSDM.1988.B-1-6