[S-IIIB-3] A New Photobleachable Positive Resist for KrF Excimer Laser Lithography

Masayuki ENDO, Yoshiyuki TANI, Masaru SASAGO, Kazufumi OGAWA, Noboru NOMURA (1.Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd.)

https://doi.org/10.7567/SSDM.1988.S-IIIB-3