[A-8-4] An Advanced Fabrication Technology of Hemispherical Grained (HSG) Poly-Si for High Capacitance Storage Electrodes

H. Watanabe, T. Tatsumi, T. Niino, A. Sakai, S. Adachi, N. Aoto, K. Koyama, T. Kikkawa (1.Microelectronics Research Labs., NEC Corp., 2.Fundamental Research Labs., NEC Corp., 3.VLSI Development Division, NEC Corp.)

https://doi.org/10.7567/SSDM.1991.A-8-4