[PB7-3] The Optimization of In-Situ Thermal Cleaning Focused on Surface Microroughness for Future Si Epitaxial Growth

A. Ohkura、H. Oku、K. Matsumoto、T. Ohmi (1.Department of Electronics, Faculty of Engineering Tohoku University)

https://doi.org/10.7567/SSDM.1991.PB7-3