[B-3-3] Impact of Nitrogen Implantation on Highly Reliable Sub-Quarter Micron LDD MOSFETs

S. Shimizu, T. Kuroi, S. Kusunoki, Y. Okumura, M. Inuishi, T. Hirao (1.ULSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1995.B-3-3