[B-3-3] Impact of Nitrogen Implantation on Highly Reliable Sub-Quarter Micron LDD MOSFETs

S. Shimizu、T. Kuroi、S. Kusunoki、Y. Okumura、M. Inuishi、T. Hirao (1.ULSI Laboratory, Mitsubishi Electric Corporation)

https://doi.org/10.7567/SSDM.1995.B-3-3