[B-7-2] A Novel Technique for Investigating Hot-Electron-Induced Oxide Damages and Device Degradations in Submicron LDD n-MOSFET's

G.-H. Lee、Steve S. Chung (1.Department of Electronic Engineering and Institute of Electronics National Chiao Tung University)

https://doi.org/10.7567/SSDM.1995.B-7-2