Ultra Shallow p+n Junction Formation Using the Solid Phase Diffusion(SPD) through &apos;a-Si/Thin Barrier Oxide&apos; Layer

Sang Jik Kwon; Byung Gook Park; Jong Duk Lee

doi:https://doi.org/10.7567/SSDM.1995.C-2-2

[C-2-2] Ultra Shallow p+n Junction Formation Using the Solid Phase Diffusion(SPD) through 'a-Si/Thin Barrier Oxide' Layer

Sang Jik Kwon, Byung Gook Park, Jong Duk Lee (1.Dept. of Electronics Engineering, Kyungwon Univ., 2.Inter-Univ. Semicon. Res. Center, Seoul Nat. Univ.)

https://doi.org/10.7567/SSDM.1995.C-2-2

1995 International Conference on Solid State Devices and Materials

[C-2-2] Ultra Shallow p+n Junction Formation Using the Solid Phase Diffusion(SPD) through 'a-Si/Thin Barrier Oxide' Layer