[C-4-4] Highly Manufacturable Shallow Trench Isolation for Giga Bit DRAM

B. H Roh, Y. H Cho, Y. G Shin, C. G hong, S. D Gwun, K. Y Lee, H. G Kang, K. N kim, J. W Park (1.R&D Center, Samsung Electronics Co., LTD.)

https://doi.org/10.7567/SSDM.1995.C-4-4