[PA-1-1] N2O-Anneal Induced Local Thinning of Regrown Oxide due to Nitrogen Residue at LOCOS Isolation Edges

Chimoon Huang、K. T. Sung、N. C. Peng、M. Chao、Y. Chang、F. C. Shone (1.Macronix International Co., LTD)

https://doi.org/10.7567/SSDM.1995.PA-1-1