[PA-1-1] N2O-Anneal Induced Local Thinning of Regrown Oxide due to Nitrogen Residue at LOCOS Isolation Edges

Chimoon Huang, K. T. Sung, N. C. Peng, M. Chao, Y. Chang, F. C. Shone (1.Macronix International Co., LTD)

https://doi.org/10.7567/SSDM.1995.PA-1-1